CVD( chemical vapor deposition)/PVD(physical vapor deposition) PVD and CVD are coating techniques, which we can use to deposit thin films on various substrates. Coating of substrates is important on many occasions. Coating can improve the functionality of the substrate; introduce new functionality onto the substrate, protect it from harmful external forces, etc. so these are important techniques. Although both processes share similar methodologies, there are few differences between PVD and CVD; therefore, they are useful in different instances.